Octadecyltrimethoxysilane
2D model of octadecyltrimethoxysilane
Names
Preferred IUPAC name
Trimethoxy(octadecyl)silane
Other names
n-Octadecyltrimethoxysilane
Trimethoxyoctadecylsilane
Identifiers
3D model (JSmol)
Abbreviations OTMS
5791830
ChemSpider
ECHA InfoCard 100.019.400
EC Number
  • 221-339-2
MeSH n-Octadecyltrimethoxysilane
UNII
  • InChI=1S/C21H46O3Si/c1-5-6-7-8-9-10-11-12-13-14-15-16-17-18-19-20-21-25(22-2,23-3)24-4/h5-21H2,1-4H3
    Key: SLYCYWCVSGPDFR-UHFFFAOYSA-N
  • InChI=1/C21H46O3Si/c1-5-6-7-8-9-10-11-12-13-14-15-16-17-18-19-20-21-25(22-2,23-3)24-4/h5-21H2,1-4H3
  • CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC
  • O(C)[Si](OC)(OC)CCCCCCCCCCCCCCCCCC
Properties
C21H46O3Si
Molar mass 374.681 g·mol−1
Appearance Colorless liquid
Density 0.883 g cm−3
Melting point 16 to 17 °C (61 to 63 °F; 289 to 290 K)
Boiling point 170 °C (338 °F; 443 K)
1.438-1.44
Hazards[1]
GHS labelling:
GHS07: Exclamation mark
Warning
H315, H319, H335
P261, P264, P271, P280, P302+P352, P304+P340, P305+P351+P338, P312, P332+P313, P337+P313, P362, P403+P233, P405, P501
NFPA 704 (fire diamond)
NFPA 704 four-colored diamond
2
1
0
Safety data sheet (SDS)
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references

Octadecyltrimethoxysilane (OTMS) is an organosilicon compound. This colorless liquid is used for preparing hydrophobic coatings and self-assembled monolayers. It is sensitive toward water, irreversibly degrading to a siloxane polymer.[2] It places a C18H39SiO3 "cap" on oxide surfaces. The formation of OTMS monolayers is used for converting hydrophilic surfaces to hydrophobic surfaces, e.g. for use in certain areas of nanotechnology and analytical chemistry.

See also

References

  1. ↑ "Octadecyltrimethoxysilane". pubchem.ncbi.nlm.nih.gov. Retrieved 5 December 2021.
  2. ↑ P. Fontaine; F. Rondelez (1995). J. Daillant; P. Guenoun; C. Marques; P. Muller; J. Tran Thanh Van (eds.). Kinetics of Polymerisation in Langmuir Monolayers of n-Alkyltrimethoxysilane. {{cite book}}: |work= ignored (help)

Further reading

  • Hild, R; David, C; Müller, H. U; Völkel, B; Kayser, D. R; Grunze, M (1998). "Formation and Characterization of Self-assembled Monolayers of Octadecyltrimethoxysilane on Chromium: Application in Low-Energy Electron Lithography". Langmuir. 14 (2): 342–346. doi:10.1021/la970438l.
  • Vidon, S; Leblanc, R. M (1998). "Langmuir Study of Octadecyltrimethoxysilane Behavior at the Air−Water Interface". The Journal of Physical Chemistry B. 102 (7): 1279–1286. doi:10.1021/jp973334s.
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